[发明专利]除抛光膏粉剂型超声波清洗剂及制备方法

摘要

本发明公开一种除抛光膏粉剂型超声波清洗剂，所用原料及质量百分比如下：氢氧化钾1~3%、碳酸钠10~40%、磷酸氢二钠10~36%、三聚磷酸钠1~10%、亚硝酸钠1~10%、QYL-252C1~8%、QYL-201~3%、NP-61~3%、渗透剂JFC0.5~5%及有机硅消泡剂1~4%。制备方法按如下步骤进行：开动粉体制作搅拌器，按照粉体制作搅拌的操作规程，将计算称量的碳酸钠、磷酸氢二钠、三聚磷酸钠、亚硝酸钠、氢氧化钾依次徐徐加入到搅拌器中，边加入边搅拌，当固体搅拌均匀后，再将计算称量的QYL-252C、QYL-20、NP-6、渗透剂JFC、有机硅消泡剂依次徐徐加到搅拌器中，直到充分搅拌均匀为止，放料包装。

主权项

一种除抛光膏粉剂型超声波清洗剂，其特征在于所用原料及质量百分比如下：                 氢氧化钾                                                        1~3%                 碳酸钠                                                            10~40%                 磷酸氢二钠                                                    10~36%                 三聚磷酸钠                                                    1~10%                 亚硝酸钠                                                        1~10%                 除蜡水专用表面活性剂                                1~8%                 常用喷淋脱脂专用无泡表面活性剂            1~3%                 NP‑6                                                                1~3%                 渗透剂JFC                                                     0.5~5%                 有机硅消泡剂                                                1~4%。